Title:
TARGET FOR ALLOY SPUTTERING AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3545787
Kind Code:
B2
Abstract:
PURPOSE: To film-form a metallic reflection layer or the like for an optical magnetic recording medium having recording sensitivity by including grains containing fine particles having a specific average particle diameter in a specific mirror-finished Al alloy observed with scanning electron microscope.
CONSTITUTION: A target for Al alloy sputtering is formed from an Al-M alloy, where M is one or more kinds of Mg, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Fe, Co, Ni, Cu and Zn. The mirror-finished alloy contains M-enriched fine grains having ≤5μm average particle diameter in the observation with the scanning electron microscope. The content of M is 1-40wt.%. The Al-M alloy is melted and made powdery by high speed quenching method and the obtained powder is press molded. As a result, the target for Al-M alloy sputtering uniform in M content is produced even at the time of making the M content high.
Inventors:
Yukio Kawaguchi
Sachiko Matsubuchi
Sachiko Matsubuchi
Application Number:
JP24982193A
Publication Date:
July 21, 2004
Filing Date:
September 10, 1993
Export Citation:
Assignee:
tdk Corporation
International Classes:
C22C21/00; C23C14/34; G11B7/00; G11B7/26; (IPC1-7): C23C14/34; C22C21/00; G11B7/00; G11B7/26
Domestic Patent References:
| JP4099171A | ||||
| JP4017670A |
Attorney, Agent or Firm:
Yoichi Ishii