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Title:
TARGET FOR MAGNETRON SPUTTERING, TRANSPARENT CONDUCTIVE FILM DEPOSITION METHOD, AND METHOD OF MANUFACTURING ORGANIC ELECTROLUMINESCENCE ELEMENT
Document Type and Number:
Japanese Patent JP2008050625
Kind Code:
A
Abstract:

To provide a sputtering target capable of depositing a transparent conductive film by the magnetron sputtering without any wasteful consumption of a sputtering target material, and easily controlling the resistivity and the transmittance of the transparent conductive film in a target for the magnetron sputter which has a mask on a substrate to perform the pattern-forming of the transparent conductive film on the substrate by the magnetron sputtering method.

The target for the magnetron sputter is obtained by inserting targets of columnar pin shape formed of the same material for a transparent conductive film as the target or other conductive material for the transparent conductive film in a large number of holes in a disk-shaped target formed of a material for the transparent conductive film having a large number of holes opened therein in a completely filling manner.


Inventors:
KURIYA YUTAKA
Application Number:
JP2006000225117
Publication Date:
March 06, 2008
Filing Date:
August 22, 2006
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
C23C14/34; C23C14/08; H01B13/00; H01L51/50; H05B33/04; H05B33/10; H05B33/28