Title:
TARGET MATERIAL FOR MAGNETIC THIN FILM AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3534264
Kind Code:
B2
Abstract:
PURPOSE: To produce a target material for a magnetic thin film of Fe-Ta series in which the dispersion of the compsn. of a film obtd. by sputtering can be reduced and to provide a method for producing the same.
CONSTITUTION: This target material has a compsn. contg., by atom, 5 to 15% Ta, preferably contg. ≤10% Cr as well, and the balance espential Fe and has a compsn. in which lumpy compounds with ≤50μm maximum grain size essentially consisting of Fe and Ta in the matrix essentially containing Fe, and long granular compounds with ≤50μm maximum grain size essentially consisting of Fe and Ta are dispersed. The target is obtd. by subjecting the molten metal of the alloy having the same compsn. to casting at the casting temp. of above the liq. temp. of the same alloy to the m.p. +50°C.
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Inventors:
Taniguchi, Shigeru
Murata, Hideo
Murata, Hideo
Application Number:
JP27444694A
Publication Date:
June 07, 2004
Filing Date:
October 13, 1994
Export Citation:
Assignee:
HITACHI METALS LTD
International Classes:
C23C14/34; C22C38/00; C22C38/12; C22C38/26; G11B5/31; (IPC1-7): C23C14/34; C22C38/00; C22C38/12; C22C38/26; G11B5/31