Title:
TARGET VESSEL, FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING TARGET VESSEL, AND PRESSURE SENSOR
Document Type and Number:
Japanese Patent JP2021116437
Kind Code:
A
Abstract:
To provide a target vessel capable of effectively suppressing contamination of impurities into a film formed on a substrate.SOLUTION: A target vessel 100 includes a depression 3 and a body part 1. A powder material MT used for a sputtering target TA can be arranged in the depression 3; the depression 3 is formed in the body part 1; the depression 3 includes a depression main body 33 and a first coating layer 31; the first coating layer 31 can cover the depression main body 33 and contact the powder material MT; the depression main body 33 has a component different from that of the first coating layer 31; The first coating layer 31 consists of: the same component as the powder material MT; the same component as a solid material included in the powder material MT; a compound between the same component as the solid material included in powder material MT and gas; or a compound between the same component as the powder material MT and the gas.SELECTED DRAWING: Figure 2
Inventors:
YOSHIKADO SHINZO
OHACHI TADASHI
TAKEMOTO KIKUROU
UNO HIROYUKI
KIMURA NAOTO
TAKASAKI MASANORI
OHACHI TADASHI
TAKEMOTO KIKUROU
UNO HIROYUKI
KIMURA NAOTO
TAKASAKI MASANORI
Application Number:
JP2020008636A
Publication Date:
August 10, 2021
Filing Date:
January 22, 2020
Export Citation:
Assignee:
DOSHISHA
OHACHI TADASHI
YAMANAKA HUTECH CORP
OHACHI TADASHI
YAMANAKA HUTECH CORP
International Classes:
C23C14/34; H01L21/285; H01L41/113; H01L41/187; H01L41/22; H01L41/316
Attorney, Agent or Firm:
Hiroyuki Maei