TECHNIQUE AND APPARATUS FOR FORMING A COATING ON GLASS SUBSTRATES

Japanese Patent JP3280069

B2

PURPOSE: To for effectively a desired coating at a low cost without disturbing the environment of a float bath within the enclosure thereof by limiting a contact time between a precursor mixture and glass in the formation of the coating on the surface of a moving glass substrate by pyrolysis from a precursor gaseous mixture.
CONSTITUTION: The technique forms a coating with an interference function on the surface of a moving glass substrate based on silicon, oxygen and carbon from a precursor gaseous mixture essentially without any oxidizing component and comprising a silane and an ethylene compound by pyrolysis in a gas stream path. In this case, the contact time between the precursor mixture and the glass is maintained at a value greater than that necessary for the deposition of the coating if this were performed from a precursor gaseous mixture containing an oxidizing agent. Thus, the coating obtained has a refractive index lying between 1.45 and 2 and its thickness reaches values greater than 50 nm on the glass substrate. The deposition of the coating is made on a glass sheet at about 700°C in the inside of the enclosure of a float glass bath.

JP5889276	Methods for Producing Liquid Silane Compositions and Silicone Materials
JP6664917	Cyclic halosilane compound and its production method, handling method, and cyclic silane compound production method

Vincent Sobine
Jean-Francois Udal

JP15325792A

April 30, 2002

June 12, 1992

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Saint-Gobain Bitrage

C01B33/04; C03B18/12; C03C17/00; C03C17/22; C03C17/245; C03C17/34; C23C16/30; C23C16/52; G02B1/10; G03F7/095; (IPC1-7): C03C17/245; C03C17/34; G02B1/10

JP6163545A
JP6479040A

Aoki Akira (3 outside)

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