Title:
TEST PATTERN, TEST PATTERN EVALUATION METHOD, PATTERN TRANSFER CHARACTERISTIC EVALUATION METHOD, PHOTOMASK, AND ORIGINAL PLATE FOR TRANSFER
Document Type and Number:
Japanese Patent JP2017211426
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a test pattern capable of improving an accuracy in analysing a frequency component of roughness, a test pattern evaluation method, a pattern transfer characteristic evaluation method, a photomask having the test pattern and an original plate for transfer.SOLUTION: A test pattern for evaluating roughness is synthesized with roughness combining with a plurality of frequencies. The pattern is structured so that each of the plurality of frequencies is not an odd number times other frequencies.SELECTED DRAWING: Figure 4
Inventors:
NISHIYAMA YASUSHI
Application Number:
JP2016102615A
Publication Date:
November 30, 2017
Filing Date:
May 23, 2016
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G03F1/44; G01B15/08; H01L21/66
Attorney, Agent or Firm:
Patent business corporation Ogasawara patent office