PURPOSE: To obtain a thermal head capable of high speed printing and having a high reliability at a high speed by a method wherein a thin film resistance layer is formed on the upper surface of a glaze layer and a heat impact relaxing layer is provided between said glaze layer and said thin film resistance layer.
CONSTITUTION: A glass glazing layer 2 is provided on an alumina substrate 1 and a thin oxide film of SiO2, Al2O3, Ta2O5 is formed by spattering on the layer as a heat impact relaxing layer 7. Then, after a thin film heating resistance layer 3 is formed by a vacuum process on the relaxing layer, lead electrodes 4 are patterned by vacuum deposition or the llike and, moreover, a protective layer 5, a wear-proof layer 6 are provided sequentially by spattering to obtain a thermal head. Material like Ni-Cr, Ta2N, Ta-Si, SiC or the like is used for the thin film heating resistance layer 3. When the thin film heating resistance layer 3 is of Ta2N, Ta2O5 is suitable for the heat impact relaxing layer 7.
JPS5217833A | 1977-02-10 | |||
JPS5456453A | 1979-05-07 | |||
JPS5351753A | 1978-05-11 | |||
JPS56159175A | 1981-12-08 |