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Title:
THERMAL HEAD
Document Type and Number:
Japanese Patent JPS5783475
Kind Code:
A
Abstract:

PURPOSE: To obtain a thermal head capable of high speed printing and having a high reliability at a high speed by a method wherein a thin film resistance layer is formed on the upper surface of a glaze layer and a heat impact relaxing layer is provided between said glaze layer and said thin film resistance layer.

CONSTITUTION: A glass glazing layer 2 is provided on an alumina substrate 1 and a thin oxide film of SiO2, Al2O3, Ta2O5 is formed by spattering on the layer as a heat impact relaxing layer 7. Then, after a thin film heating resistance layer 3 is formed by a vacuum process on the relaxing layer, lead electrodes 4 are patterned by vacuum deposition or the llike and, moreover, a protective layer 5, a wear-proof layer 6 are provided sequentially by spattering to obtain a thermal head. Material like Ni-Cr, Ta2N, Ta-Si, SiC or the like is used for the thin film heating resistance layer 3. When the thin film heating resistance layer 3 is of Ta2N, Ta2O5 is suitable for the heat impact relaxing layer 7.


Inventors:
KAWACHI AKIHIKO
Application Number:
JP15995480A
Publication Date:
May 25, 1982
Filing Date:
November 13, 1980
Export Citation:
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Assignee:
SUWA SEIKOSHA KK
International Classes:
B41J2/335; H01L49/02; (IPC1-7): H01L49/02
Domestic Patent References:
JPS5217833A1977-02-10
JPS5456453A1979-05-07
JPS5351753A1978-05-11
JPS56159175A1981-12-08



 
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