THERMAL TREATMENT APPARATUS AND THERMAL TREATMENT METHOD

Title:

THERMAL TREATMENT APPARATUS AND THERMAL TREATMENT METHOD

Document Type and Number:

Japanese Patent JP2014027252

Kind Code:

A

Abstract:

To provide a thermal treatment apparatus and a thermal treatment method capable of heating a workpiece under required conditions regardless of the type of a base material.

A strip workpiece 8 is transported at a constant speed from a feed roller 11 to a take-up roller 12 by roll-to-roll system. The workpiece 8 is obtained by laminating a functional layer of nanoink, or the like, on the surface of a base material of resin, such as PEN. When irradiating the surface of the workpiece 8 with light from the xenon lamp 21 of a main heating light source 20, while transporting the workpiece 8 at a constant speed, each position on the surface of the workpiece 8 is irradiated with light for a short time. Consequently, only the functional layer 82 can be heated to a required temperature, without heating the base material 81 poor in heat resistance excessively.

Inventors:

KIMURA TAKAHIRO
SHIBUTA KOJI
KUWATA YUTAKA

Application Number:

JP2013009870A

Publication Date:

February 06, 2014

Filing Date:

January 23, 2013

Export Citation:

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Assignee:

DAINIPPON SCREEN MFG

International Classes:

H01L21/26; F27B9/24; F27B9/36; F27D11/02; H01L21/28

Domestic Patent References:

JP2010161251A	2010-07-22
JP2001040485A	2001-02-13
JP2010027873A	2010-02-04
JP2006309253A	2006-11-09
JP2012101052A	2012-05-31
JP2013229476A	2013-11-07
JP2008147533A	2008-06-26
JP2010225645A	2010-10-07
JPH10223532A	1998-08-21
JPH10256170A	1998-09-25

Attorney, Agent or Firm:

Yoshitake Hidetoshi
Takahiro Arita

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