Title:
熱処理装置
Document Type and Number:
Japanese Patent JP6466154
Kind Code:
B2
Abstract:
The present invention provides a heat treatment apparatus which can suppress scratches on a surface of a workpiece. A heat treatment apparatus (1) transmitting a workpiece (W) and heat-treating the workpiece during the transmission of the workpiece includes: a heat treatment portion (2); a carrying-in portion (3) carrying the workpiece in the heat treatment portion; and a carrying-out portion (4) carrying the workpiece out of the heat treatment portion. The carrying-in portion, the carrying-out portion and the heat treatment portion respectively include: a plurality of conveying rolls (10), rotating shafts of which are configured to the horizontal, the plurality of conveying rolls (10) being arranged side by side along a workpiece transfer path (L); and a plurality of guiding rolls (11), rotating shafts of which are configured to be vertical, wherein the plurality of guiding rolls (11) are arranged at one side in the horizontal direction of the transfer path side by side along the transfer path, the rotating shafts of the conveying rolls are oblique relative to the transfer path, so in two axial end portions of the conveying rolls, end portions (10a) at one side in the horizontal direction of the transfer path are positioned at an upstream side of the transfer path compared with the other end portions (10b).
More Like This:
JPH10273719 | WALKING BEAM TYPE HEATING FURNACE |
Inventors:
Masayuki Komatsu
Uryu Jun
Shoichiro Iwasaki
Uryu Jun
Shoichiro Iwasaki
Application Number:
JP2014250139A
Publication Date:
February 06, 2019
Filing Date:
December 10, 2014
Export Citation:
Assignee:
Neturen Co., Ltd.
International Classes:
F27B9/24; B65G39/10; C21D1/00; C21D1/42; F27B9/36
Domestic Patent References:
JP7054048A | ||||
JP60219038A | ||||
JP52146866U | ||||
JP53133521A | ||||
JP46027940B1 | ||||
JP54107918A | ||||
JP2010255910A | ||||
JP53071483A | ||||
JP55146999U |
Attorney, Agent or Firm:
Patent Business Corporation Koei Patent Office
Takeshi Takamatsu
Toshiyuki Ozawa
Takeshi Takamatsu
Toshiyuki Ozawa
Previous Patent: 磁気記憶素子及びその製造方法
Next Patent: PRODUCTION OF POLYISOCYANATE CONTAINING ALLOPHANATE GROUP
Next Patent: PRODUCTION OF POLYISOCYANATE CONTAINING ALLOPHANATE GROUP