Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
熱処理装置
Document Type and Number:
Japanese Patent JPWO2016158029
Kind Code:
A1
Abstract:
熱処理装置が、被処理物（Ｘ）を加熱処理する加熱室（２）と、加熱室に隣接して設けられ、被処理物を加熱室との間で出し入れすると共に被処理物の周囲を真空雰囲気とする水分除去室（１）とを備える。

More Like This:
JP2008007829CONVEYING DEVICE OF VACUUM HEAT TREATMENT FURNACE
JPH04305360METHOD FOR OPERATING VACUUM BRAZING FURNACE FOR HEAT RESISTANT STEEL
WO/1997/000974A METHOD AND AN APPARATUS FOR THE TREATMENT OF COMPONENTS BY A GAS MIXTURE
Inventors:
Kazuhiko Katsumata
Application Number:
JP2017509355A
Publication Date:
July 20, 2017
Filing Date:
February 12, 2016
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Ihi Co., Ltd.
Ihi Mechanical Systems Co., Ltd.
International Classes:
C21D1/773; C21D1/74; F27B17/00; F27D7/06
Domestic Patent References:
JPH08295926A1996-11-12
JP2011241469A2011-12-01
JP2006010097A2006-01-12
JPH08295926A1996-11-12
JP2011241469A2011-12-01
JP2006010097A2006-01-12
JPS5735621A1982-02-26
JPH0533044A1993-02-09
JPS5735621A1982-02-26
JPH0533044A1993-02-09
Attorney, Agent or Firm:
Mitsuo Teramoto
Masatake Shiga
Hisanori Takahashi



 
Previous Patent: A communication apparatus and a network system

Next Patent: Loudspeaker device