Title:
THERMAL TREATMENT OVEN
Document Type and Number:
Japanese Patent JP3186306
Kind Code:
B2
Abstract:
PURPOSE: To obtain a thermal treatment oven which is simple in structure and able to thermally treat works in succession without giving them vibrations.
CONSTITUTION: Electrode paste is applied to chip parts, a large number of chip parts are held in a holding plate A, and the holding plate A is transferred into a drying oven 1. Vane frames 37 are radially provided to a rotary body 31 which rotates intermittently around a shaft 30, and a pair of inward holding grooves which hold both the sides of the holding plate A slidable in the axial direction of the shaft 30 is provided to each of the vane frames 37. The holding plate A transferred to an inlet/outlet by a conveyer is inserted into the holding grooves by a loading arm. Heating zones are provided inside the oven 1, and the electrode paste is dried up while the rotary body 31 is rotated by a single turn.
Inventors:
Yoshitaka Hata
Tetsuya Kuga
Hidekazu Kurihara
Toshihiko Kogame
Tetsuya Kuga
Hidekazu Kurihara
Toshihiko Kogame
Application Number:
JP4465693A
Publication Date:
July 11, 2001
Filing Date:
February 08, 1993
Export Citation:
Assignee:
MURATA MANUFACTURING CO.,LTD.
International Classes:
F26B15/00; H01C17/00; H01C17/28; H01G13/04; (IPC1-7): H01G13/04; F26B15/00
Domestic Patent References:
| JP52146857A | ||||
| JP6388816A | ||||
| JP63105326U |
Attorney, Agent or Firm:
Hidetaka Tsutsui
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