THERMOPLASTIC RESIN COMPOSITION WITH EXCELLENT IMPACT RESISTANCE

Title:

THERMOPLASTIC RESIN COMPOSITION WITH EXCELLENT IMPACT RESISTANCE

Document Type and Number:

Japanese Patent JP3052985

Kind Code:

B2

Abstract:

PURPOSE: To obtain thermoplastic resin compositions with excellent impact resistance even at low temperatures.
CONSTITUTION: Thermoplastic resin compositions comprise (A) 30-70 wt.% polyamide resins; (B) 20-60 wt.% graft polymers of 10-60 wt.% rubber polymers, 40-90 wt.% aromatic vinyl monomers, and 10-90 wt.% vinyl cyanide monomers; (C) 0-30 wt.% copolymers of 40-90 wt.% aromatic vinyl monomers, 10-60 wt.% vinyl cyanide monomers, and 0-40 wt.% other vinyl monomers; (D) 1-30 wt.% modified styrenic resins obtained by grafting a mixture of aromatic compounds and olefin compounds with unsaturated carboxyl compounds having a carboxylic acid group or an acid anhydride group; and (E) 1-30 wt.% maleic imide copolymers of 30-70 wt.% aromatic vinyl monomers, 30-50 wt.% maleic imide monomers, 1-20 wt.% unsaturated dicarboxylic acid anhydride monomers, and 0-50 wt.% other monomers.

Inventors:

Ku Jun Kee
Yeo Hee Gu
Lim Jon Churu

Application Number:

JP25065894A

Publication Date:

June 19, 2000

Filing Date:

October 17, 1994

Export Citation:

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