THERMOSETTING POSITIVE TYPE PHOTOSENSITIVE COMPOSITION

Title:

THERMOSETTING POSITIVE TYPE PHOTOSENSITIVE COMPOSITION

Document Type and Number:

Japanese Patent JPH0798503

Kind Code:

A

Abstract:

PURPOSE: To provide a photosensitive compsn. having satisfactory appliability on a stepped part and used at the time of producing a solid-state image pickup element, a liq. crystal element, etc.

CONSTITUTION: This photosensitive compsn. for a stepped substrate consists of an alkali-soluble resin, a photosensitive agent, a heat curing agent and a solvent based on a mixture of a solvent selected from among alkyl lactate, alkyl alkoxypropionate, propylene glycol monoalkyl et.her and propylene glycol monoalkyl ether acetate with a ketone solvent having ≤150°C b.p.

Inventors:

TSUTSUMI YOSHITAKA
TANAKA TETSUO
MIYAMURA HIROYUKI
HASEGAWA MASAZUMI

Application Number:

JP24282893A

Publication Date:

April 11, 1995

Filing Date:

September 29, 1993

Export Citation:

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Assignee:

TOSOH CORP

International Classes:

G03F7/004; G02B1/04; G02B5/20; G03F7/022; G03F7/023; (IPC1-7): G03F7/022; G02B1/04; G02B5/20; G03F7/004; G03F7/023

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