Title:
THIN FILM COLD CATHODE
Document Type and Number:
Japanese Patent JP2001202869
Kind Code:
A
Abstract:
To provide a thin film cold cathode using a stable nitride semiconductor thin film in the atmosphere.
This thin film cold cathode emits electrons from a nitride semiconductor thin film formed on the substrate into a vacuum. After forming of the nitride semiconductor thin film, it is processed in hydrogen fluoride acid solution.
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Inventors:
IKEDA JUNJI
Application Number:
JP2000009618A
Publication Date:
July 27, 2001
Filing Date:
January 19, 2000
Export Citation:
Assignee:
NIKON CORP
International Classes:
H01J9/02; H01J1/30; H01J1/304; H01L21/027; (IPC1-7): H01J1/304; H01J1/30; H01J9/02; H01L21/027
Attorney, Agent or Firm:
Toshiaki Hosoe