Title:
薄膜の形成方法及び光学素子
Document Type and Number:
Japanese Patent JP7041424
Kind Code:
B2
Abstract:
To provide a method for forming a thin film, capable of not only easily manufacturing a vapor deposited thin film at low cost by substantially reducing the number of layers of a multilayer optical thin film manufactured by the alternate layer of a low refractive index material and a high refractive index material, but also preventing the vapor deposited thin film from being cracked, peeled and broken, etc.SOLUTION: A method for forming a thin film comprises: placing a vapor deposition substrate 1, a dielectric material as a high refractive material and a plastic material as a low refractive material in a vacuum chamber in order to form a thin film on a vapor deposition substrate 1; and sequentially heating these dielectric material and plastic material in a dry process to deposit thin films on the vapor deposition substrate 1 and form a multilayer optical thin film. A dielectric thin film 2 is formed by vacuum evaporation, sputtering, resistance heating or electron beams, and a plastic thin film 3 is formed by a vacuum evaporation method for evaporating the plastic material by electron beams or resistance heating.SELECTED DRAWING: Figure 3
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Inventors:
Kunio Yoshida
Takayuki Okamoto
Takayuki Okamoto
Application Number:
JP2017185532A
Publication Date:
March 24, 2022
Filing Date:
September 27, 2017
Export Citation:
Assignee:
Kunio Yoshida
Okamoto Optics Co., Ltd.
Okamoto Optics Co., Ltd.
International Classes:
C23C14/06; B32B7/023; B32B9/00; C23C14/12; G02B1/115
Domestic Patent References:
| JP9096701A | ||||
| JP2012256041A |
Foreign References:
| WO2013122253A1 | ||||
| US20130302627 |
Attorney, Agent or Firm:
Michio Iizuka