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Patent Searching and Data


Title:
THIN FILM FORMING DEVICE
Document Type and Number:
Japanese Patent JPH097169
Kind Code:
A
Abstract:

PURPOSE: To eliminate the need for interrupting film forming work and cleaning a microwave transmission window by providing a thin film forming device with a deposition preventive plate which can transmit microwaves freely exchangeably so as to face the microwave transmission window disposed at the microwave reaction tube of a plasma reaction plasma reaction tube.

CONSTITUTION: The microwaves through a waveguide are introduced through the microwave transmission window 2a of the plasma reaction tube 2 to which reactive gases are supplied. The plasma is then excited and cyclotron resonance is induced by the magnetic field by a coil 3 for ECR. The film formation by plasma CVD is thus executed. The reaction tube 2 is internally freely exchangeably provided with the deposition preventive plate 4 which is supplied from a deposition preventive plate holder 5 via push rods 6, 9 and is discharged to a deposition preventive plate recovering pocket 13 so as to face the window 1a, thereby, the deposition of carbon, etc., accompanying the CVD work on the deposition preventive plate 4 is prevented. Accordingly, the need for interrupting the film forming work, removing the window 2a from the reaction tube 2 and cleaning the window is eliminated. The continuation of the good CVD film forming work without interruption is thus made possible.


Inventors:
IMAMURA HIDEKI
SHIGA AKIRA
MIZUNOYA HIROHIDE
Application Number:
JP14990995A
Publication Date:
January 10, 1997
Filing Date:
June 16, 1995
Export Citation:
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Assignee:
KAO CORP
International Classes:
C30B25/00; C23C16/27; C23C16/50; C23C16/511; G11B5/84; (IPC1-7): G11B5/84; C23C16/50; C30B25/00
Attorney, Agent or Firm:
Utaka Katsumi