Title:
THIN SILICON OXIDE FILM-LAMINATED GAS BARRIER FILM
Document Type and Number:
Japanese Patent JPH05186622
Kind Code:
A
Abstract:
PURPOSE:To provide a silicon oxide gas barrier film excellent in the retort resistance, flexural resistance and gas barrier property as a packaging film. CONSTITUTION:In a gas barrier film produced by vacuum-depositing a thin silicon oxide film on at least one surface of a plastic film, a silicon oxide gas barrier film having an excellent gas barrier property due to the thin film having a specific gravity of 1.80-2.20, having extremely good retort resistance and gervo resistance (flexural resistance) and highly effective on practical uses is obtained.
Inventors:
MATSUDA NAGANARI
IZEKI SEIJI
MORIHARA YOSHIHARU
UNO TOSHIO
OTANI TOSHIYUKI
YAMADA YOZO
IZEKI SEIJI
MORIHARA YOSHIHARU
UNO TOSHIO
OTANI TOSHIYUKI
YAMADA YOZO
Application Number:
JP2457892A
Publication Date:
July 27, 1993
Filing Date:
January 13, 1992
Export Citation:
Assignee:
TOYO BOSEKI
International Classes:
B32B7/02; B32B9/00; B32B27/06; C08J7/06; (IPC1-7): B32B7/02; B32B9/00; B32B27/06; C08J7/06