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Title:
THREE-DIMENSIONAL SURFACE ANALYSIS METHOD
Document Type and Number:
Japanese Patent JP2005140767
Kind Code:
A
Abstract:

To provide a nondestructive three-dimensional surface analysis method for three-dimensionally and precisely analyzing the surface of a specimen and the interior of the specimen from the surface to a prescribed depth.

This three-dimensional surface analysis method includes stages α, β and γ. (α) A beam of a specific wavelength is irradiated to a region of the surface of an intended specimen to measure the intensity of photo-electrons at an emission angle that a normal line of the specimen surface forms with the emission direction of excited photo-electrons, and composition distribution is detected in the depth direction of the intended specimen at one region thereof by using intensity data obtained by measuring the emission angle of the photo-electrons. (β) Composition distribution is detected in the depth direction of the intended specimen at respective positions on the surface of the intended specimen while changing incident position of the beam of the specific wavelength to the intended specimen. (γ) Data are collected on composition distribution by depth at respective positions on the surface of the intended specimen to perform three-dimensional analysis.


Inventors:
Lee, Jae-cheol
Asanov, Igor
Application Number:
JP2004000293975
Publication Date:
June 02, 2005
Filing Date:
October 06, 2004
Export Citation:
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Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
G01N21/31; G01N23/227; H01J37/252; H01J40/00; H01J47/00; (IPC1-7): G01N23/227; H01J37/252
Attorney, Agent or Firm:
磯野 道造