Title:
TITANIA NANO FINE CRYSTAL DISPERSED THIN FILM PATTERN AND PRODUCTION METHOD FOR THE SAME AND ARTICLE WITH THE THIN FILM PATTERN
Document Type and Number:
Japanese Patent JP3960882
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a titania nano fine crystal dispersed thin film with titania nano fine crystal thin films dispersed at optional parts of a substrate as an optional pattern of submicron order, and also provide a production method used for the same, and an article with the thin film pattern.
SOLUTION: A film containing a compound metal oxide or hydroxide of a titanium compound and a silicon alkoxide modified with β-diketone is formed from a solution containing the silicon alkoxide, a hydrolyzable titanium compound and β-diketone. This film is masked with a predetermined pattern and irradiated with UV rays. After the parts irradiated with the UV rays are cured, nonirradiated parts are etched, and then the irradiated parts are contacted with water or hot water to deposit titania fine crystals on the surface thereof, and thus the titania nano fine crystal dispersed thin pattern is produced.
Inventors:
Masahiro Tatsumi sand
Toshihiro Kogure
Tsutomu Minami
Tadaga Seiji
Atsushi Matsuda
Toshihiro Kogure
Tsutomu Minami
Tadaga Seiji
Atsushi Matsuda
Application Number:
JP2002237606A
Publication Date:
August 15, 2007
Filing Date:
August 16, 2002
Export Citation:
Assignee:
Japan Science and Technology Agency
International Classes:
B01J35/02; B01J21/06; B01J37/34; (IPC1-7): B01J35/02; B01J21/06; B01J37/34
Domestic Patent References:
| JP2001314761A | ||||
| JP2000246115A |
Other References:
松田厚範,β-ジケトンで安定化したチタンアルコキシドを用いて作成されるシリカチタニア系ゲル膜の温水処理によるアナターゼナノ微結晶の生成,日本化学会講演予稿集,2002年 3月11日,vol.81st, No.1,p.195
小川良平,紫外線照射によるビニルシルセスキオキサン-チタニア系ゲル膜の特性変化とマイクロパターニングへの応用,日本化学会講演予稿集,2002年 3月11日,vol.81st, No.1,p.195
小川良平,紫外線照射によるビニルシルセスキオキサン-チタニア系ゲル膜の特性変化とマイクロパターニングへの応用,日本化学会講演予稿集,2002年 3月11日,vol.81st, No.1,p.195
Attorney, Agent or Firm:
Toshio Nishizawa