Title:
TITANIUM MATERIAL AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPH08277427
Kind Code:
A
Abstract:
PURPOSE: To provide a method for producing a titanium material capable of executing stable sputtering.
CONSTITUTION: Gaseous TiI4 is fed, and an iodide process is used to precipitate titanium having high purity. This precipitated titanium is vacuum-sealed in a compression vessel, and the compression vessel sealed with titanium is carried in a HIP device, is heated within the range of 600 to 1200°C and is pressurized within the range of 100 to 1000kg/cm2. Thus, voids in the grain boundaries are allowed to disappear, and a titanium material stable at the time of sputtering can be produced.
Inventors:
YOSHIMURA YASUTOKU
ONISHI TAKASHI
KOBAYASHI KAZUO
OKAMOTO SETSUO
ONISHI TAKASHI
KOBAYASHI KAZUO
OKAMOTO SETSUO
Application Number:
JP8142795A
Publication Date:
October 22, 1996
Filing Date:
April 06, 1995
Export Citation:
Assignee:
SUMITOMO SITIX CORP
International Classes:
C22B34/12; C23C14/34; C23C16/14; C23C16/56; F27B17/00; (IPC1-7): C22B34/12; C23C14/34; C23C16/14; C23C16/56; F27B17/00
Attorney, Agent or Firm:
河野 登夫