PURPOSE: To improve a display grade by forming a resist film on the transparent electrode on a glass substrate, processing the resist film with an etching liquid, cleaning and drying the substrate, implanting ion species at a required dosing quantity to the substrate, removing the resist film and cleaning and drying the substrate.

CONSTITUTION: The resist film 2 of the desired patterns is formed on ITO 3. The ITO 3 is then processed with the resist film 3 as a mask by using the etching liquid to form space parts 4 of the parts having no ITO on the substrate 1. The main surface of the substrate 1 is then irradiated with the single or plural ions by using an implanting machine. The ions are directly implanted to the surface of the glass substrate 1 in the space parts 4 and are implanted to the resist film 2 in the other parts at this time. Only the ions implanted to the space parts 4 of the substrate 1 remain when the resist film 2 is removed. Further, the substrate 1 is heat treated to color the space parts 4, i.e.. to stabilize the light shielding characteristics thereof. The dosing amt. to be implanted is ≥1019/cm2.