Title:
POSITIVE RESIST COMPOSITION
Document Type and Number:
Japanese Patent JPH0659447
Kind Code:
A
Abstract:
PURPOSE: To obtain a positive resist composition well-balanced in various characteristics such as sensitivity, residual film ratio and resolution, particularly small in dimensional change with exposure in fine working of <1μm and excellent in pattern shape.
CONSTITUTION: The positive resist composition contains an alkali soluble phenol resin, a sensitizer of quinone diazide sulfonate of a specific polyhydroxy compound and a hydroxy compound expressed by a formula. In the formula, each of R19-R22 is hydrogen atom, halogen atom, hydroxyl group, 1-8C alkyl group, 2-5C alkenyl group or phenyl substituted alkoxyl group and can be the same with or different from each other.
Inventors:
KAWADA MASAJI
KUSUNOKI TETSUAKI
KASHIWAGI MOTOFUMI
FUJII TOSHIAKI
KUSUNOKI TETSUAKI
KASHIWAGI MOTOFUMI
FUJII TOSHIAKI
Application Number:
JP23535492A
Publication Date:
March 04, 1994
Filing Date:
August 11, 1992
Export Citation:
Assignee:
NIPPON ZEON CO
International Classes:
G03F7/022; G03F7/004; H01L21/027; (IPC1-7): G03F7/022; H01L21/027
Attorney, Agent or Firm:
Nishikawa Shigeaki
Next Patent: 着火袋