PURPOSE: To obtain an image forming member for electrophotography with superior heat resistance, resistance to an optical structural change, and surface electric characteristics by forming an adsorption layer of an electron accepting molecule or an electron donative molecule for a-Si:F:H (amorphous fluorinated silicon) on the surface of a photoconductive layer made of a-Si:F:H.

CONSTITUTION: An adsorption layer is formed by bringing a gaseous or liq. electron donative molecule such as NH3, H2O, naphthalene, biphenyl or fluorene or a gaseous or liq. electron accepting molecule such as O2, ozone, 1,5-dinitronaphthalene or 1,8-dinitronaphthalene into contact with the surface of a photoconductive layer made of n-type a-Si:F:H contg. only donor or both donor and acceptor at a higher donor concn., p-type a-Si:F:H contg. only acceptor or both donor and acceptor at a higher acceptor concn., or i-type a-Si: F:H contg. neither acceptor nor donor or contg. acceptor and donor at the same concn. Said molecule may be activated to plasma, ionic or radical state, and said photoconductive layer may be composed of at least 2 kinds of a-Si:F:H by multilayer joining.