Title:
BRUSH WASHING DEVICE AND WORK-WASHING SYSTEM
Document Type and Number:
Japanese Patent JPH0817771
Kind Code:
A
Abstract:
PURPOSE: To improve washing efficiency by reducing brush washing time, freely controlling the washing time for a work, for example, a wafer, and washing even the outermost periphery part of the wafer, and incorporating the bnush washing device into a work washing system.
CONSTITUTION: In a brush washing device 10 which is provided with at least one brush washing means 12A and 12B consisting of a pair of rotary brushes 12a, 12a'; 12b, 12b' being provided opposingly up and down and washes a circular-plate work W which is carried between a pair of rotary brushes, a stopper means 22 for stopping or unloading the circular-plate work is provided in front of the rotary direction of the brush washing means.
Inventors:
UCHIYAMA ISAO
NAKANO MASAMI
TAKAMATSU HIROYUKI
SUZUKI MORIE
NAKANO MASAMI
TAKAMATSU HIROYUKI
SUZUKI MORIE
Application Number:
JP15187494A
Publication Date:
January 19, 1996
Filing Date:
July 04, 1994
Export Citation:
Assignee:
SHINETSU HANDOTAI KK
International Classes:
B08B1/02; B08B3/02; H01L21/00; B08B1/04; H01L21/304; (IPC1-7): H01L21/304; B08B1/04
Domestic Patent References:
JPS6468934A | 1989-03-15 | |||
JPH0370133A | 1991-03-26 | |||
JPS62188642A | 1987-08-18 | |||
JPS60106137A | 1985-06-11 | |||
JPS63266850A | 1988-11-02 | |||
JPS60240129A | 1985-11-29 | |||
JPS6273728A | 1987-04-04 | |||
JPS62259447A | 1987-11-11 |
Attorney, Agent or Firm:
Shoji Ishihara
Next Patent: ROTARY SUBSTRATE WASHING DEVICE