Title:
【発明の名称】露光方法
Document Type and Number:
Japanese Patent JP2610815
Kind Code:
B2
Abstract:
In a step-and-repeat exposure method, an alignment error does not influence accuracy of a shot arrangement on a photosensitive substrate. An amount corresponding to an alignment error of a reticle with respect to the apparatus is detected, a position as an origin of an x-y stage for moving a photosensitive substrate is corrected by the detected amount, and a step-and-repeat exposure is then performed using the reticle.
Inventors:
Atsushi Yamaguchi
Shinichi Hasegawa
Shinichi Hasegawa
Application Number:
JP20727685A
Publication Date:
May 14, 1997
Filing Date:
September 19, 1985
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/30; G03F1/76; G03F7/23; G03F9/00; H01L21/027; H01L21/67; H01L21/68; (IPC1-7): H01L21/027; G03F9/00; H01L21/68
Domestic Patent References:
| JP60173550A | ||||
| JP60160613A | ||||
| JP5780724A | ||||
| JP56114320A | ||||
| JP5918950A | ||||
| JP59161815A | ||||
| JP5021232B1 |
Attorney, Agent or Firm:
Takao Watanabe