PURPOSE: To apply always a specified amt. of a non-essential component on a thin film at a high filming speed in a method for forming a thin alloy film on a substrate in a vacuum by directing the vapor flow of one material and the sputtering particles of the other material simultaneously toward the substrate.
CONSTITUTION: Co which is an essential component is evaporated by heating on a substrate of a synthetic resin film; at the same time, a slight amt. of Cr which is a non-essential component to be incorporated is sputtered, in the production of, for example, a vertical magnetization recording medium of a non-coated type. The resulted vapor flow of Co and the sputtering particles of Cr are directed simultaneously toward the substrate film. Since the essential component is vapor-deposited by ion plating, the filming speed is high. Since the non-essential component is filmed by sputtering, always a specified amt. can be added into the thin film and the filming speed over the entire part is not affected by the low speed with the sputtering as the non-essential component is very slight in content.
NAHARA AKIRA
ARAI YOSHIHIRO
