Title:
【発明の名称】発熱方法
Document Type and Number:
Japanese Patent JP3096058
Kind Code:
B2
Abstract:
PURPOSE:To obtain a heat generating method which is the same as a conventional method by using hydrogen which is extremely cheaper than heavy hydrogen by a method wherein heat is generated by applying potential gradient between both surfaces of a plate shaped body, for which one surface of a hydrogen occlusion plate is covered with a thin film, the hydrogen atom diffusion constant of which is small. CONSTITUTION:A sample, for which on one surface of a hydrogen occlusion palladium plate 1, an oxide or nitride thin film 2 is adhered, is held at the boundary between a hydrogen gas chamber 3 and a vacuum chamber 4 through O rings 5. The vacuum chamber 4 is isolated from the hydrogen chamber 3 by the sample and O rings, and becomes dischargeable at a high vacuum, by a turbo molecular pump 6. Heat reaction is generated by applying potential from a voltage source 7, between both surfaces of the hydrogen occlusion palladium plate 1. As the thin film 2, a film of which the hydrogen atom diffusion constant is small, such as a film of aluminum oxide, manganese oxide, silicon oxide, aluminum nitride or silicon nitride, etc., is usable, and it is adhered on the surface of the palladium plate by a thickness of approximately 100-2000Angstrom , by the vapor-deposition process.
Inventors:
Eiichi Yamaguchi
Takashi Nishioka
Takashi Nishioka
Application Number:
JP31264890A
Publication Date:
October 10, 2000
Filing Date:
November 20, 1990
Export Citation:
Assignee:
Nippon Telegraph and Telephone Corporation
International Classes:
F24J3/00; C01B3/00; C25B1/02; F25B17/12; G21B3/00; G21B1/00; (IPC1-7): F24J3/00; F25B17/12
Domestic Patent References:
| JP6385001A |
Attorney, Agent or Firm:
Takashi Sawai