Title:
ETCHING METHOD OF METALLIC PLATE
Document Type and Number:
Japanese Patent JPS5943900
Kind Code:
A
Abstract:
PURPOSE:To form prescribed fine patterns with high accuracy, by etching the parts of the main surfaces of a metallic plate consisting essentially of Fe, Ni to prescribed patterns where photosensitive films are removed by a chemical etching method then etching electrolytically said parts. CONSTITUTION:A photosensitive soln. is coated on both main surfaces of a thin sheet of an ''Invar'' alloy or the like consisting essentially of Fe and Ni to form films in the stage of etching a shadow mask for, for example, a color picture receiving tube. The photosensitive films are exposed through a mask pattern having prescribed aperture patterns. The films are then developed and the exposed photosensitive films of the prescribed patterns are removed. The parts removed of the photosensitive films are etched by a chemical etching method, whereby the prescribed aperture parts are penetrated. Such thin alloy sheet is put into an electrolytic etching liquid vessel and is subjected to electrolytic etching in the state of stirring the electrolyte, thus the circumferential edges of the apertures are smoothed.
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Inventors:
OOTAKE YASUHISA
KANTOU MASAHARU
KANTOU MASAHARU
Application Number:
JP15382482A
Publication Date:
March 12, 1984
Filing Date:
September 06, 1982
Export Citation:
Assignee:
TOKYO SHIBAURA ELECTRIC CO
International Classes:
H01J9/14; C25F3/02; C25F3/14; H01J29/07; (IPC1-7): C25F3/14; H01J29/07
Attorney, Agent or Firm:
Noriyuki Noriyuki