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Title:
【発明の名称】光吸収性ポリマー組成物の製造方法
Document Type and Number:
Japanese Patent JP2002516621
Kind Code:
A
Abstract:
The present invention recites a method comprising reacting in a solvent in the presence of a base a) at least one diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1200 nm and 99-0 mole % of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm, with b) an organic compound of Formula II X-B-X1 wherein B is a divalent organic radical to form a light absorbing composition comprising a mixture of a polymer having the formula and a cyclic compound having the general formula wherein B is as defined above; n is at least 2, m is 1, 2, 3 or 4 and A comprises the residue of a diacidic monomer comprising about 1 to 100 mole % of at least one light-absorbing monomer having a light absorption maximum between about 300 nm and about 1000 nm and wherein the remaining portion of A comprises the residue of a non-light absorbing monomer which does not absorb significant light at wavelengths above 300 nm or has a light absorption maximum below 300 nm.

Inventors:
Weaver, max, allen
Kultak, James John, Senior
Maxwell, Brian Edison
Rose, jerry faust
Hilbert, Samuel David
Fresher, Jean Carroll
Parrum, William Whitfield
Application Number:
JP52492298A
Publication Date:
June 04, 2002
Filing Date:
November 25, 1997
Export Citation:
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Assignee:
Eastman Chemical Company
International Classes:
C08L101/00; C09B1/32; C09B1/58; C09B1/62; C09B5/14; C09B29/01; C09B29/033; C09B29/08; C09B29/36; C09B31/02; C09B35/14; C09B57/00; C09B69/10; C09K3/00; (IPC1-7): C09B69/10; C08L101/00; C09B1/32; C09B1/58; C09B1/62; C09B5/14; C09B29/01; C09B29/033; C09B29/36; C09B35/14; C09B57/00
Attorney, Agent or Firm:
Takashi Ishida (4 others)



 
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