Title:
【発明の名称】有害ガスの浄化方法
Document Type and Number:
Japanese Patent JP3073321
Kind Code:
B2
Abstract:
PURPOSE:To extremely effectively and safely remove harmful gas in the various states by bringing gas contg. halogenide which becomes a harmful component into contact with a purifying agent which zinc oxide, aluminum oxide and alkaline compounds are mixed. CONSTITUTION:When using a cylinder 2 contg. harmful gas of halogenide, such as dichlorosilane, hydrogen chloride, tungsten hexafluoride and chlorine trifluoride used in a semiconductor production process, the gas usually is fed with the cylinder housed in a cylinder housing device connected to a ventilating duct 5 called a cylinder box 3 to prevent the direct contamination of the open air in the case of gas leakage. After the harmful gas is used, the removal of noxious components precedes the release in the air. For that, the gas is brought into contact with a purifying agent consisting of zinc oxide, aluminum oxide and alkaline compounds to effectively and extremely rapidly remove the noxious components. This is very effective for purifying harmful gas.
Inventors:
Noboru Akita
Toshiya Hatakeyama
Takashi Shimada
Keiichi Iwata
Toshiya Hatakeyama
Takashi Shimada
Keiichi Iwata
Application Number:
JP16910492A
Publication Date:
August 07, 2000
Filing Date:
June 26, 1992
Export Citation:
Assignee:
Japan Pionics Co., Ltd.
International Classes:
B01D53/02; B01D53/14; B01D53/34; B01D53/68; B01J20/08; (IPC1-7): B01D53/02; B01D53/68; B01J20/08
Domestic Patent References:
| JP243917A | ||||
| JP275318A | ||||
| JP340901A |