【発明の名称】シリコン薄膜の製造方法

Title:

【発明の名称】シリコン薄膜の製造方法

Document Type and Number:

Japanese Patent JP3007579

Kind Code:

B2

More Like This:

WO/2020/013643	METAL PLATE DEPOSITION MASK FOR OLED PIXEL DEPOSITION
JP2015140464	VAPOR DEPOSITION MASK DEVICE, AND THERMAL BARRIER MATERIAL
JP2001089843	SUBSTRATE HAVING SILICON DIOXIDE FILM THEREON

Inventors:

Makoto Yoshida
Takahiro Saida
Satoshi Okada
Masahiro Akamatsu
Kenichi Kondo

Application Number:

JP34992696A

Publication Date:

February 07, 2000

Filing Date:

December 27, 1996

Export Citation:

Assignee:

Stanley Electric Co., Ltd.

International Classes:

C23C14/24; H01L21/203; H01L21/336; H01L29/786; (IPC1-7): H01L21/203; C23C14/24

Domestic Patent References:

Attorney, Agent or Firm:

Keishiro Takahashi (2 outside)

Previous Patent: 硬質表面の洗浄方法及び硬質表面用洗浄剤含浸物品

Next Patent: 軸受の伸縮リテーナー