Title:
MANUFACTURE OF HARD MASK
Document Type and Number:
Japanese Patent JPS6057624
Kind Code:
A
Abstract:
PURPOSE:To prevent a proximity effect resulting from remnant charges and pattern strain by previously forming a position, to which a resist layer is not shaped, to the surface of the outer edge section of a mask blank and exposing the resist layer by electron beams while an electrode for grounding is brought into contact with the position. CONSTITUTION:At least one or more of positions 9, to which resist layers are not formed, are formed previously outside a pattern forming prearranged position 10 in the surface of a blank block 5. Electron beams EB are projected to the surface of the resist layer 4 while electrodes 7 for grounding are brought into contact with Cr oxide layers 3 exposed to the positions 9 by pressure to expose a circuit pattern. According to the method, since the electrodes 7 are brought into contact with the layers 3, charged electric charges do not remain in a layer 4, the layers 3 and a layer 2 and escape to the ground through the electrodes 7, thus resulting in no possiblity in which defective patterns are generated.
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Inventors:
MATSUOKA YASUO
Application Number:
JP16422283A
Publication Date:
April 03, 1985
Filing Date:
September 08, 1983
Export Citation:
Assignee:
TOSHIBA KK
International Classes:
H01L21/027; G03F1/00; G03F1/20; G03F1/68; G03F7/20; (IPC1-7): G03F1/00
Domestic Patent References:
| JPS58170830U | 1983-11-15 |
Attorney, Agent or Firm:
Eiji Morota
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