PURPOSE: To regulate exactaly a gap by providing a regist film on the surface intended for a front gap, providing a necessary spacer film thereto then removing the regist film with a remover.
CONSTITUTION: The surface 23 on a ferrite wafer 20 facing the other ferrite facer is polished to a specular surface and a regist film 30 having about 1μm thickness is provided uniformly on the polished surface. The regist film of the other part except the region P including the part to be used as a front gap afterward and the periphery thereof is removed by using a remover. A line of regist film 31 is formed in the longitudinal direction of the wafer 20. A spacer film 40 consisting of SiO2 is provided by using a vapor deposition method on the surface 23 of the wafer 20 and the surface of the film 31. This spacer film 40 regulates the gap length of a magnetic head and the thickness thereof is regulated to about 0.3W0.5μm.
OGAWA TAKAHIRO
OONISHI TOSHIO
DOI MASARU
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