PURPOSE: To provide a method and a device increasing a contaminant removing ratio in a treating of waste gas.
CONSTITUTION: (1) The waste gas is supplied to the second chamber of a closed vessel 1 divided into the first chamber 5, the second chamber 6 and the third chamber 7 by the first dividing plate 2 and the second dividing plate 3. (2) The waste gas supplied to the second chamber is blown in the first absorbing soln. of the first chamber 6 through a gas dispersing pipe 9 laid vertically to the first dividing plate. (3) The waste gas at an upper space of the first chamber is introduced to the third chamber through a waste gas rising cylinder 10. (4) The waste gas introduced to the third chamber is brought into contact with drops of the second absorbing soln. formed by a spray nozzle 18. (5) The second absorbing soln. retaining on the second separating plate is circulated to the spray nozzle. (6) A purified waste gas in the third chamber is discharged through a purified waste gas outlet 11.
KAWAMURA KAZUSHIGE
IWASAKI MAMORU
WAKABAYASHI ATARU
