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Title:
FILM FORMATION METHOD
Document Type and Number:
Japanese Patent JPH0669189
Kind Code:
A
Abstract:

PURPOSE: To provide a method of forming an equal and highly oriented film by controlling the rate of the ingredients of film manufacture substances, in the film formation method by LB method.

CONSTITUTION: An LB film is formed by controlling the rate between the paracresol resin 12 of cresol novolak resin 11 and the metacresol novolak 13, 14, and 15, the film formation substances. Hereby, it becomes possible to form an equal and highly oriented LB film which is applicable to higher resolution resist as compared with the case where existing cresol novolak resin is used. Moreover, a microfine pattern can be made by making use of this film.


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Inventors:
MIURA NAOKO
YOSHIMURA TOSHIYUKI
CHOKAI MINORU
SHIRAISHI HIROSHI
OKAZAKI SHINJI
Application Number:
JP21999692A
Publication Date:
March 11, 1994
Filing Date:
August 19, 1992
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
C08G8/12; G03F7/16; H01L21/027; H01L21/312; H01L21/368; (IPC1-7): H01L21/312; C08G8/12; G03F7/16; H01L21/027; H01L21/368
Attorney, Agent or Firm:
Ogawa Katsuo



 
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