PURPOSE: To provide a cleaning step with high accuracy, by eliminating a re- attached contamination on a face of a substrate while a treatment time and the quantity of chemical are reduced.

CONSTITUTION: A cleaning chemical solution is fed from a chemical feeding nozzle 18 to a face of a substrate (W) and an inert gas is blown from a gas blowing nozzle 40 to the face of the substrate (W) to remove the chemical solution used in the cleaning process. While the substrate (W) is rotated, the chemical solution is fed to the face of the substrate (W) and the chemical solution is removed, and these steps are repeated continuously in a short time.