Title:
【発明の名称】フォトマスクおよびその製造方法
Document Type and Number:
Japanese Patent JP2771907
Kind Code:
B2
Abstract:
A first anti-reflection film is inserted between a transparent glass substrate and the light shielding pattern. The first anti-reflection film has a refractive index larger than that of the glass substrate but smaller than that of the light shielding pattern. A second anti-reflection film is formed on the glass substrate between adjacent light shielding patterns. The second anti-reflection film has a refractive index larger than that of air but smaller than that of the glass substrate. Thus, a light beam entering the glass substrate is not reflected at the front surface of the glass substrate regardless of whether the light beam entered in a portion provided with a light shielding pattern.
Inventors:
KAMON KAZUYA
Application Number:
JP11993391A
Publication Date:
July 02, 1998
Filing Date:
May 24, 1991
Export Citation:
Assignee:
MITSUBISHI DENKI KK
International Classes:
G03F1/00; G03F1/54; G03F1/68; G03F1/80; H01L21/027; H01L21/30; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
| JP54114306A | ||||
| JP2158735A | ||||
| JP3102353A | ||||
| JP480756A |
Attorney, Agent or Firm:
Shigeaki Yoshida (2 outside)