Title:
【発明の名称】ホトレジスト組成物及びパターン形成方法
Document Type and Number:
Japanese Patent JP2848611
Kind Code:
B2
Abstract:
PURPOSE:To obtain patterns having high contrast by using a specific azide compd. as a photosensitive agent, exposing the photosensitive film formed thereof with far UV light and developing the same with an alkaline developing soln. CONSTITUTION:This compsn. is formed of the photosensitive agent expressed by the formula I and an alkali soluble resin and the photosensitive film formed thereof is exposed by using <=313nm far UV light and is developed by the alkaline developing soln. In the formula, A- denotes the formula II or the formula II; R1, R2 denote an alkyl group, alkenyl group, aryl group or aralkyl group; R3, R4 denote an alkyl group, aryl group, aralkyl group, alkoxy group or aryloxyl group; X denotes O or NH. Since this photoresist compsn. has a large difference between the transmittance before exposing and the transmittance after exposing and, therefore, the resist pattern having high resolution is obtd. by exposing the compsn. with the far UV light.
Inventors:
HAYASHI KEIICHI
KIKUCHI HIDEO
KIKUCHI HIDEO
Application Number:
JP18036988A
Publication Date:
January 20, 1999
Filing Date:
July 21, 1988
Export Citation:
Assignee:
TOYO GOSEI KOGYO KK
International Classes:
G03F7/004; C08G8/00; C08G8/10; C08G61/10; C08G61/12; C08L33/24; C08L35/00; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/004; H01L21/027
Domestic Patent References:
| JP284648A | ||||
| JP1231039A | ||||
| JP61223837A |
Attorney, Agent or Firm:
Mitsuishi Toshiro