Title:
【発明の名称】ポジ型フォトレジスト組成物
Document Type and Number:
Japanese Patent JP2617381
Kind Code:
B2
Abstract:
A positive photoresist composition containing (i) a quinone diazide polymer formed by reacting a cresol-formaldehyde novolac resin and an o-quinonediazide compound, and (ii) a sulfonamide development enhancement agent.
Inventors:
David Earl Basset
Gary A. Amstutz
Gary A. Amstutz
Application Number:
JP18388791A
Publication Date:
June 04, 1997
Filing Date:
June 28, 1991
Export Citation:
Assignee:
OSG Microelectronic Materials Incorporated
International Classes:
G03F7/004; G03F7/022; G03F7/023; H01L21/027; H01L21/30; (IPC1-7): G03F7/023; G03F7/004; H01L21/027
Domestic Patent References:
| JP57135947A | ||||
| JP61250637A | ||||
| JP2866A | ||||
| JP1105243A |
Attorney, Agent or Firm:
Motohiro Kurauchi (1 outside)
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