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Patent Searching and Data


Title:
【発明の名称】セフェム-及びイソオキサセフェム誘導体の製造
Document Type and Number:
Japanese Patent JP2950795
Kind Code:
B2
Abstract:
The invention is concerned with a new process for the preparation of compounds of formula wherein R<1> is trityl, acetyl, tetrahydropyranyl or cyclopentyl; R<2> is hydrogen, hydroxy, lower alkyl, cycloalkyl, lower alkoxy, lower alkenyl, lower alkynyl, aryl, aryloxy, aryl-lower alkyl, aryl-lower alkoxy or heterocyclyl or heterocyclyl-lower alkyl; the lower alkyl, cycloalkyl, lower alkoxy, lower alkenyl, cycloalkenyl, lower alkynyl, aryl-lower alkyl, aryl, aryloxy, aryl-lower alkoxy, the heterocyclyl moieties being unsubstituted or substituted with at least one group selected from carboxy, amino, nitro, cyano, lower alkyl, lower alkoxy, hydroxy, halogen, -CONR<21>R<22>, -N(R<22>)COOR<23>, R<22>CO-, R<22>OCO- or R<22>COO-, wherein R<21> is hydrogen, lower alkyl, or cycloalkyl; R<22> is hydrogen or lower alkyl; R<23> is lower alkyl, lower alkenyl or a carboxylic acid protecting group; Y is -S- and Z is -CH2- or Y is -CH2- and Z is -O-, by acylation of a compound of formula with an activated carboxylic acid derivative of formula wherein R<3> is lower alkyl, and R<1>, R<2>, X, Y, Z have the significance given above; and it is further concerned with compounds of formula III.

Inventors:
TOOMASU OOBAAHAUZAA
Application Number:
JP15113197A
Publication Date:
September 20, 1999
Filing Date:
June 09, 1997
Export Citation:
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Assignee:
EFU HOFUMAN RA ROSHU UNTO CO AG
International Classes:
C07D277/40; C07D501/00; C07D501/04; C07D501/06; C07D501/24; C07D501/56; C07D277/20; C07D505/00; C07D507/04; C07D507/06; C07D507/08; C07D515/02; C07F9/6539; (IPC1-7): C07D501/06; C07D501/56; C07D507/04; C07D507/06; C07D507/08; C07F9/6539
Domestic Patent References:
JP72884A
JP6321954A
Other References:
【文献】国際公開96/12712(WO,A1)
Attorney, Agent or Firm:
Hajime Tsukuni (1 person outside)