Title:
【発明の名称】増感オニウム塩
Document Type and Number:
Japanese Patent JP2650841
Kind Code:
B2
Abstract:
Onium salt capable of generating acid upon exposure to actinic radiation having the following structure: (R1)a(R2)b(R3)cQ+-A-M+X--B-X'- where: Q is S; R1, R2 and R3 are independently substituted or unsubstituted aromatic, aliphatic, or aralkyl groups having 7-18 carbon atoms; M+ is a cationic organic radical; A is a divalent radical selected from the group of hindered alkylene groups, substituted or unsubstituted aromatic or aralkyl groups; B is a divalent aromatic sensitizer which absorbs radiation having a wavelength longer than 300 nm and is capable of transferring an electron to Q, x- and X'- are anionic groups; and wherein A provides a spatial separation between Q and M, and B provides a spatial separation between X and X', such that the spatial separation provided by A between Q and M is substantially the same as the spatial separation provided by B between X and X'.
Inventors:
AANOSUTO RAIZAA
SHIAOOFUA HEE
SHIAOOFUA HEE
Application Number:
JP30761693A
Publication Date:
September 10, 1997
Filing Date:
December 08, 1993
Export Citation:
Assignee:
II AI DEYUHON DE NIMOASU ANDO CO
International Classes:
C07C25/02; C07C309/43; C07C381/12; C07F9/54; C08F2/50; C08G59/68; C08G65/10; C09K3/00; G03F7/029; (IPC1-7): C07C381/12; C07C25/02; C07F9/54; C09K3/00; G03F7/029
Attorney, Agent or Firm:
Chika Takagi (2 outside)