Title:
PHOTOSENSITIVE COMPOUND AND PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JPH0792675
Kind Code:
A
Abstract:
PURPOSE: To reduce absorption of far ultraviolet lights and to enhance photoschemical reaction (photoacid generation) efficiency by using a specified compound.
CONSTITUTION: The photosensitive compound is represented by the formula in which each of R1 and R4 is, independently, a 1-8C straight, branched, or cyclic alkyl; R2 is a 2-9C straight, branched, or cyclic alkyl; each of R3 and R5 is, independently, a 3-7C 2-oxoalkyl; and Y- is a counter anion, such as BF4 (tetrafluoroborate ion), AsF6-(hexafluoroarsenate ion), Sbf6-(hexafluoroantimonate ion), CH3SO3-(methanesulfonate ion), ClO4-(perchlorate ion), or the like.
Inventors:
MAEDA KATSUMI
NAKANO KAICHIRO
IWASA SHIGEYUKI
HASEGAWA ETSUO
NAKANO KAICHIRO
IWASA SHIGEYUKI
HASEGAWA ETSUO
Application Number:
JP23382093A
Publication Date:
April 07, 1995
Filing Date:
September 20, 1993
Export Citation:
Assignee:
NEC CORP
International Classes:
G03F7/004; C07C381/12; C09K3/00; G03F7/029; G03F7/039; H01L21/027; (IPC1-7): G03F7/029; C07C381/12; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JPH05216235A | 1993-08-27 | |||
| JPH0395556A | 1991-04-19 |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)
Next Patent: 音声認識方法