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Title:
【発明の名称】リポ酸を使用するアクネの治療
Document Type and Number:
Japanese Patent JP2003519165
Kind Code:
A
Abstract:
Active acne and acneiform scars are treated by topical application of a composition containing lipoic acid and/or a lipoic acid derivative such as dihydrolipoic acid, a lipoic or dihydrolipoic acid ester, a lipoic or dihydrolipoic acid amide, a lipoic or dihydrolipoic acid salt, and mixtures of any of these to reduce erythema, pore size, and scarring. Topical application of lipoic acid and/or a lipoic acid derivatives are advantageously used with at least one adjunct ingredient such as a retinoid, an antibiotic, or benzoyl peroxide conventionally used for acne, alone or in combination with dimethylaminoalcohol, an alpha-hydroxy acid such as glycolic acid, a tyrosine, tocotrienol, and/or a fatty acid ester of ascorbic acid. One preferred embodiment contains a combination of lipoic acid, an alpha-hydroxy acid, and dimethylaminoalcohol.

Inventors:
Nicholas Buey, Perricone
Application Number:
JP2001549619A
Publication Date:
June 17, 2003
Filing Date:
January 02, 2001
Export Citation:
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Assignee:
Nicholas Buey, Perricone
International Classes:
A61K8/365; A61K8/49; A61K31/133; A61K31/19; A61K31/198; A61K31/203; A61K31/221; A61K31/327; A61K31/355; A61K31/375; A61K31/385; A61K31/65; A61K31/7048; A61K31/7056; A61K45/06; C07D339/04; A61L26/00; A61P17/00; A61P17/10; A61Q19/00; (IPC1-7): A61K31/385; A61K31/133; A61K31/19; A61K31/198; A61K31/203; A61K31/221; A61K31/327; A61K31/355; A61K31/375; A61K31/65; A61K31/7048; A61K31/7056; A61P17/00; A61P17/10; C07D339/04
Domestic Patent References:
JPH11509553A1999-08-24
JPS6322510A1988-01-30
JPH09501925A1997-02-25
Foreign References:
WO1999045900A11999-09-16
Attorney, Agent or Firm:
Takehiko Saito (1 outside)