Title:
POSITIVE TYPE ELECTRON BEAM RESIST
Document Type and Number:
Japanese Patent JPS5842041
Kind Code:
A
Abstract:
A positive working electron beam resist comprising a resinous condensation product of formaldehyde with a phenol or a cresol having a chloro substituent ortho to the hydroxyl group on its aromatic ring is imagewise exposed to electron beam irradiation and then the exposed portion of the resist is dissolved away to leave a petterned mask.
Inventors:
JIEEMUZU EKONOMII
ROI JIYON GURITSUTAA
HIROYUKI HIRAOKA
ROI JIYON GURITSUTAA
HIROYUKI HIRAOKA
Application Number:
JP10148182A
Publication Date:
March 11, 1983
Filing Date:
June 15, 1982
Export Citation:
Assignee:
IBM
International Classes:
G03C1/72; C08G8/00; G03F7/039; (IPC1-7): C08G8/14; G03C1/72
Attorney, Agent or Firm:
Tsukio Okada