Title:
【発明の名称】ビームダイアフラムからなるX線検査装置
Document Type and Number:
Japanese Patent JPH09508048
Kind Code:
A
Abstract:
An X-ray examination apparatus includes a beam diaphragm (3) with an X-ray absorbing shutter (4, 31, 32) which is arranged between the X-ray source (1) and the X-ray detector (9) in order to intercept parts of the X-ray beam (2), thus forming a limited X-ray beam (7). The shutter (4, 31, 32) can be displaced according to different degrees of freedom by different rotations of control rings (21, 22, 41, 42, 47, 48) whereto the shutter (4, 31, 32) is coupled. Because the shutter (4, 31, 32) can be moved to practically any desired position within the X-ray beam (2), the beam diaphragm (3) can shape the cross-section of the limited X-ray beam (7) in such a manner that essentially only a part (5) of a patient (6) to be examined is exposed to X-rays.
Inventors:
Van den Becerar, Franciscus Josephus Maria
Application Number:
JP51669395A
Publication Date:
August 19, 1997
Filing Date:
October 06, 1995
Export Citation:
Assignee:
Philips Electronics N
International Classes:
A61B6/00; A61B6/06; G21K1/04; A61N5/10; (IPC1-7): A61B6/00; A61B6/06; G21K1/04
Attorney, Agent or Firm:
Tadahiko Ito (1 outside)