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Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS6051833
Kind Code:
A
Abstract:

PURPOSE: To obtain a photosensitive resin compsn. superior in image reproducibility, printing aptitude, water developability, etc. by mixing a photopolymerizable monomer having an ethylenically unsatd. bond, and a specified polymer with a perfectly or partially saponified polyvinyl acetate.

CONSTITUTION: A photosensitive resin compsn. suitably usable for a water-developable photosensitive layer for forming a letter press or lithographic plate is obtained by mixing (A) 100pts.wt. of perfectly or partially (50W100mol%) saponified polyvinyl acetate, (B) 20W200pts.wt. of a photopolymerizable monomer having en ethylenically unsatd. bond, and (C) 1W50pts.wt. obtained by homopolymerizing a polymerizable monomer, such as N,N-dimethylaminoethyl acrylate, having a group of general formula (1) and a group of general formula (2) (R1 is H or CH4, and R2, R3 are each 1W10C alkyl., or copolymerizing said monomer with another unsatd. monomer.


Inventors:
KASHIO SHIGETORA
FUJIKAWA JIYUNICHI
Application Number:
JP11813583A
Publication Date:
March 23, 1985
Filing Date:
July 01, 1983
Export Citation:
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Assignee:
TORAY INDUSTRIES
International Classes:
G03F7/004; G03F7/032; G03F7/033; G03F7/038; (IPC1-7): G03C1/71; G03F7/00
Domestic Patent References:
JPS5821736A1983-02-08
JPS5830748A1983-02-23
JPS58102230A1983-06-17
JPS5876827A1983-05-10