Title:
【発明の名称】パターン化した負電子親和力フォトカソードを利用した電子ソース
Document Type and Number:
Japanese Patent JP2001526446
Kind Code:
A
Abstract:
An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the conduction band. The photocathode has at least one active area for emission of electrons with dimensions of less than about two micrometers. The electron source further includes electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the photocathode at high vacuum. The photocathode is patterned to define emission areas. A patterned mask may be located on the emission surface of the active layer, may be buried within the active layer or may be located between the active layer and the substrate.
Inventors:
James E. Schneider
Costello, Kenneth A
McCord, Mark A
Peas, Earl Fabian
Baum, Aaron Tabru
Costello, Kenneth A
McCord, Mark A
Peas, Earl Fabian
Baum, Aaron Tabru
Application Number:
JP2000524807A
Publication Date:
December 18, 2001
Filing Date:
December 04, 1998
Export Citation:
Assignee:
INTEVAC INCORPORATED
Leland Stanford Junior University
Leland Stanford Junior University
International Classes:
G03F7/20; H01J40/06; H01J3/02; H01J27/04; H01J37/073; H01J37/075; H01J40/16; (IPC1-7): H01J40/06
Attorney, Agent or Firm:
Sumio Takeuchi (1 outside)