PATTERN INSPECTION - HITACHI LTD

Title:

PATTERN INSPECTION

Document Type and Number:

Japanese Patent JPS5833835

Kind Code:

A

Abstract:

PURPOSE:To enhance the yield of wafers in order to detect defects of pattern based on existing of the angled portions of the one or both patterns by comparing both patterns. CONSTITUTION:The window A1 shown in Fig. A is not covered with the pattern P3, while the window B1 is covered entirely with the pattern P3. In the case of Fig. B, the window A1 is not covered with the pattern P4, while the window B2 is partly covered with the pattern P4. Namely, in the case of Fig. A, the normal angled portion exists but in the case of B, the window B2 is partly covered because the angled portion of pattern P4 is partly disappearing. Therefore, it is not a normal angled portion and accordingly the pattern P4 is judged to be defective.

Inventors:

NAKAGAWA KIYOSHI
KAWASHIMA HIDEAKI

Application Number:

JP13152981A

Publication Date:

February 28, 1983

Filing Date:

August 24, 1981

Export Citation:

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