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Title:
PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JPS6010245
Kind Code:
A
Abstract:

PURPOSE: To obtain a hardened material good in water and solvent resistances through photosetting by adding a water-insoluble vinyl monomer and an polymn. initiator to a mixture of a partially saponified polyvinyl acetate and a hydrophobic polymer emulsion.

CONSTITUTION: A photosensitive resin compsn. is made of an aq. emulsion contg. (A) a photopolymerizable partially saponified polyvinyl acetate, such as partially saponified polyvinyl acetate having a stilbazolium salt introduced into it, represented by the general formula shown here, (B) a hydrophobic emulsion of a copolymer, such as vinyl acetate-ethylene, vinyl acetate-acrylate, or styrene-butadiene copolymer, (C) a water-insoluble or hardly soluble photoactive compd. having at least one ethylenically unsatd. group, (D) a photopolymn. initiator, (E) and when needed, a photo-crosslinking agent, such as bichromate or diazo resin.


Inventors:
ICHIMURA KUNIHIRO
YAMAOKA TSUGIO
KANEDA SADAYOSHI
SHIBUYA TOORU
Application Number:
JP11848683A
Publication Date:
January 19, 1985
Filing Date:
June 30, 1983
Export Citation:
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Assignee:
KOGYO GIJUTSUIN
MURAKAMI SCREEN KK
International Classes:
C08F2/00; C08F2/48; G03F7/00; G03F7/004; G03F7/032; G03F7/038; G03F7/12; (IPC1-7): G03C1/71; C08F2/48; G03C1/68; G03F7/10
Domestic Patent References:
JPS5562446A1980-05-10
JPS5811931A1983-01-22
JPS4887903A1973-11-19
JPS50108003A1975-08-26
JPS51114122A1976-10-07
JPS5351004A1978-05-10
Attorney, Agent or Firm:
Kiyoshi Inomata (1 person outside)