Title:
【発明の名称】位相シフトマスクの検査方法
Document Type and Number:
Japanese Patent JP3069417
Kind Code:
B2
Abstract:
In the system according to the present invention detects defects by projecting illumination light for exposure having a certain wavelength perpendicularly onto a phase shift mask to be examined; picking up, by means of an image acquisition section, two pattern images which are formed from the irradiated light having passed through two neighboring dies on the phase shift mask and image-formed individually through respective magnifying projection optical systems, and superposing the image patterns of two dies through an alignment to compare therebetween.
Inventors:
Makoto Tanikawa
Hiroki Tabuchi
Hiroyuki Moriwaki
Noriyuki Taniguchi
Hiroki Tabuchi
Hiroyuki Moriwaki
Noriyuki Taniguchi
Application Number:
JP30617091A
Publication Date:
July 24, 2000
Filing Date:
November 21, 1991
Export Citation:
Assignee:
Sharp Corporation
International Classes:
G01B11/24; G01B9/08; G01M11/00; G01N21/88; G01N21/94; G01N21/956; G03F1/30; G03F1/84; G03F7/20; H01L21/027; H01L21/30; (IPC1-7): G03F1/08
Domestic Patent References:
| JP337650A | ||||
| JP6465665A | ||||
| JP56142533A | ||||
| JP4177111A | ||||
| JP4127150A |
Attorney, Agent or Firm:
Takaya Koike (1 person outside)